ALEXANDRIA, Va., July 14 -- United States Patent no. D1,134,908, issued on July 14, was assigned to Shenzhen Rainbow Light Medical Equipment Co. Ltd. (Shenzhen, China).

"Phototherapy mask" was invented by Alain Dijkstra (Amstelveen, Netherlands), Cao Jiaming (Shenzhen, China) and Yin Zhichao (Shenzhen, China).

The patent was filed on July 3, 2025, under Application No. D/011,385.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1134908&OS=D1134908&RS=D1134908

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