US Patent Issued to Shenzhen Kalyan Medical Equipment on Aug. 4 for "Phototherapy mask" (Chinese, Dutch Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. D1,140,058, issued on Aug. 4, was assigned to Shenzhen Kalyan Medical Equipment Co. Ltd. (Shenzhen, China).

"Phototherapy mask" was invented by Alain Dijkstra (Amstelveen, Netherlands), Li Xiang (Shenzhen, China), Hu Chunlei (Shenzhen, China) and Zhang Yong (Shenzhen, China).

The patent was filed on Sept. 10, 2025, under Application No. D/022,402.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1140058&OS=D1140058&RS=D1140058

Disclaimer: Curated by HT Syndication....