US Patent Issued to Shenzhen Kaiyan Medical Equipment on Sept. 8 for "Phototherapy mask" (Chinese, Dutch Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. D1,147,407, issued on Sept. 8, was assigned to Shenzhen Kaiyan Medical Equipment Co. Ltd. (Shenzhen, China).

"Phototherapy mask" was invented by Alain Dijkstra (Amstelveen, Netherlands), Wen Caiyun (Shenzhen, China) and Zhang Jiali (Shenzhen, China).

The patent was filed on June 28, 2025, under Application No. D/010,639.

*For further information, including images, charts and tables, please visit: http://patft.uspto.gov/netacgi/nph-Parser?Sect1=PTO2&Sect2=HITOFF&p=1&u=%2Fnetahtml%2FPTO%2Fsearch-bool.html&r=1&f=G&l=50&co1=AND&d=PTXT&s1=D1147407&OS=D1147407&RS=D1147407

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