ALEXANDRIA, Va., Aug. 5 -- United States Patent no. D1,140,054, issued on Aug. 4, was assigned to Shenzhen Kaiyan Medical Equipment Co. Ltd. (Shenzhen, China).
"Phototherapy mask" was invented by Alain Dijkstra (Amstelveen, Netherlands), Li Xiang (Shenzhen, China) and Xie Wentao (Shenzhen, China).
The patent was filed on April 22, 2025, under Application No. D/000,385.
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