ALEXANDRIA, Va., Oct. 27 -- United States Patent no. D1,155,840, issued on Oct. 27, was assigned to Shenzhen AuraLuxe Medical Equipment Co Ltd (Shenzhen, China).
"Phototherapy mask" was invented by Alain Dijkstra (Amstelveen, Netherlands), Hu Chunlei (Shenzhen, China) and Zhang Yong (Shenzhen, China).
The patent was filed on Oct. 8, 2025, under Application No. D/027,036.
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