US Patent Issued to Shanghai Sonmol Internet Technology on July 28 for "Positive-pressure double-nozzle nasal cavity cleaner featuring double pressure protection and use method thereof" (Chinese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,691,031, issued on July 28, was assigned to Shanghai Sonmol Internet Technology Co. Ltd. (Shanghai).

"Positive-pressure double-nozzle nasal cavity cleaner featuring double pressure protection and use method thereof" was invented by YongXu Li (Mianyang City, China), Liang Lv (Chongqing City, China) and JiGuang Zhang (Xiangyang City, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention discloses a positive-pressure double-nozzle nasal cavity cleaner featuring double pressure protection, and relates to the technical field of health care. The nasal cavity cleaner consists of a nose washing end, an upper shell, a core module, a control ...