US Patent Issued to Shanghai Institute of Measurement and Testing Technology on Sept. 1 for "Adjustment method and adjustment apparatus for mutual parallelism of two back-to-back gratings" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,724,220, issued on Sept. 1, was assigned to Shanghai Institute of Measurement and Testing Technology (Shanghai).

"Adjustment method and adjustment apparatus for mutual parallelism of two back-to-back gratings" was invented by Lihua Lei (Shanghai), Lijie Liang (Shanghai), Yujie Zhang (Shanghai), Yuqing Guan (Shanghai), Yaoqiong Shen (Shanghai), Liqin Liu (Shanghai), Wenzhe Zou (Shanghai), Chuangwei Guo (Shanghai) and Yunxia Fu (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "The application provides an adjustment method and an adjustment apparatus for mutual parallelism of two back-to-back gratings, including parallelism adjustment of grating sur...