ALEXANDRIA, Va., March 3 -- United States Patent no. 12,567,473, issued on March 3, was assigned to Shanghai Huali Integrated Circuit Corp. (Shanghai).
"Efuse unit and application circuit thereof" was invented by Ying Yan (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention discloses an efuse unit and an application circuit, including a first fuse, a second fuse, a first NMOS transistor, a second NMOS transistor and a third NMOS transistor. One end of the first fuse serves as a Q1 port of the efuse unit, and the other end is connected to a drain end of the third NMOS transistor and a drain end of the first NMOS transistor. One end of the second fuse serves as a Q2 port of the efuse ...