ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,128, issued on Dec. 16, was assigned to Shanghai Huali Integrated Circuit Corp. (Shanghai).
"Four-terminal resistance testing structure" was invented by Hao Jiang (Shanghai).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present application discloses a four-terminal resistance testing structure. A test key includes a resistor string formed by connecting two or more tested resistors in series. Two ends of each tested resistor are respectively provided with one first pad. At least one of the two first pads of each tested resistor is shared as the first pad of an adjacent tested resistor. Each tested resistor includes two force terminals and two sen...