US Patent Issued to SHANGHAI FOSUN PHARMACEUTICAL INDUSTRIAL DEVELOPMENT on March 17 for "5,6-dihydrothieno[3,4-hquinazoline compound" (Chinese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,253, issued on March 17, was assigned to SHANGHAI FOSUN PHARMACEUTICAL INDUSTRIAL DEVELOPMENT Co. LTD. (Shanghai).

"5,6-dihydrothieno[3,4-hquinazoline compound" was invented by Yangyang Xu (Shanghai), Wentao Wu (Shanghai), Haizhong Tan (Shanghai), Dongkai Zhang (Shanghai), Jikui Sun (Shanghai), Yang Zhang (Shanghai) and Shuhui Chen (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a series of 5,6-dihydrothieno[3,4-h]quinazoline compounds as represented by formula (P) and pharmaceutically acceptable salts thereof, and the use of the compounds or pharmaceutically acceptable salts thereof in the preparation of solid tumor drugs, su...