US Patent Issued to Seoul National University R&DB Foundation on Aug. 25 for "Silver nanowire thin-film patterning method" (South Korean Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,113, issued on Aug. 25, was assigned to Seoul National University R&DB Foundation (Seoul, South Korea).

"Silver nanowire thin-film patterning method" was invented by Yongtaek Hong (Seoul, South Korea), Jongjang Park (Suwon-si, South Korea) and Geonhee Kim (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a silver nanowire patterning method including patterning an adhesive conductive polymer thin-film on a substrate, fabricating a polydimethylsiloxane (PDMS) stamp coated with a silver nanowire thin-film, and bonding the substrate patterned with the conductive polymer thin-film to the PDMS stamp coated with the silver nan...