US Patent Issued to SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI), SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) on Aug. 4 for "Mask plate, alignment mark and photolithography system" (Chinese Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,333, issued on Aug. 4, was assigned to SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHAI) Corp. (Shanghai) and SEMICONDUCTOR MANUFACTURING INTERNATIONAL (BEIJING) Corp. (Beijing).

"Mask plate, alignment mark and photolithography system" was invented by Wei Hua Sang (Shanghai), Shi Jie Wu (Shanghai) and Bin Xing (Shanghai).

According to the abstract* released by the U.S. Patent & Trademark Office: "A mask plate, an alignment mark and a photolithography system are provided. In one form, an alignment mark includes a plurality of alignment patterns arranged at intervals, where the alignment pattern includes a first pattern extending in a first direction and a second pattern extendin...