ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,749,656, issued on Sept. 29, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Substrate processing device and substrate processing method" was invented by Tae Sung Kim (Siheung-si, South Korea) and Duk Hyun Son (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The substrate processing device includes a chamber in which a processing space for processing a substrate is formed, a substrate support unit supporting the substrate in the processing space, a gas supply portion supplying process gas to the processing space, a gas supply unit supplying gas to the gas supply portion, and a controller connected to the gas sup...