US Patent Issued to Semes on Nov. 3 for "Droplet application device and droplet application method" (South Korean Inventors)

ALEXANDRIA, Va., Nov. 3 -- United States Patent no. 12,779,886, issued on Nov. 3, was assigned to Semes Co. LTD. (Cheonan-si, South Korea).

"Droplet application device and droplet application method" was invented by Sung Ho Choi (Cheonan-si, South Korea), Ji Eun Yi (Seoul, South Korea) and Jun Woo Lee (Cheonan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a droplet application device and a droplet application method, which check printing states for at least two directions when printing a test pattern on a substrate to check deviation of the substrate and a nozzle alignment state of an inkjet head for at least two directions. The droplet application device includes: an inkjet sys...