ALEXANDRIA, Va., May 19 -- United States Patent no. 12,629,726, issued on May 19, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).
"Apparatus for treating substrate and method for treating a substrate" was invented by Sung Hun Eom (Hwaseong-si, South Korea), Tae Won Yun (Namwon-si, South Korea), Ha Neul Yoo (Anyang-si, South Korea) and Ji Hyeong Yu (Uijeongbu-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a support unit configured to support a substrate; and a cleaning unit configured to clean a bottom surface of the substrate supported on the support unit, and wherein the cleanin...