ALEXANDRIA, Va., June 9 -- United States Patent no. 12,652,986, issued on June 9, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).

"Substrate processing apparatus and substrate processing method" was invented by Kibong Kim (Paju-si, South Korea), Seunghoon Oh (Cheonan-si, South Korea) and Younghun Lee (Cheonan-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus including a chamber including an inner space, a fluid supply unit configured to supply a supercritical fluid to the inner space, a fluid exhaust unit configured to exhaust the supercritical fluid from the inner space, and a controller configured to control the fluid supply unit and the f...