ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,149, issued on Jan. 20, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Substrate processing apparatus and substrate processing method" was invented by Min Jung Kim (Chungcheongnam-do, South Korea), Seong Soo Lee (Chungcheongnam-do, South Korea) and Jun Kil Hwang (Chungcheongnam-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a substrate processing unit for processing a substrate by discharging a chemical liquid to the substrate; a chemical storage unit connected to the substrate processing unit by a chemical liquid supply line and a chemical liquid recovery line; and a liqui...