ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,529,960, issued on Jan. 20, was assigned to Semes Co. LTD. (Cheonan-si, South Korea).
"Apparatus for treating substrate including interference alleviation unit" was invented by Sang Eun Noh (Pohang-si, South Korea), Dae Sung Kim (Suwon-si, South Korea) and Ho Jin Jang (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an apparatus for treating a substrate. The apparatus for treating the substrate includes: a first process chamber having a first treating space therein; a second process chamber having a second treating space therein; and an exhaust unit configured to exhaust atmospheres of the first treating space and the ...