ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,658, issued on Feb. 10, was assigned to Semes Co. LTD. (Cheonan-si, South Korea).
"Substrate processing apparatus and substrate processing method" was invented by Do Hyeon Yoon (Cheonan-si, South Korea), Eun Seok Kim (Cheonan-si, South Korea) and Mi So Park (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an apparatus for processing a substrate, the apparatus including: a liquid treatment chamber; a drying chamber; and a light treatment chamber, in which the light treatment chamber includes: a treatment housing having a treatment space in which the substrate is processed; a support member for supporting the substra...