ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,701,945, issued on Aug. 4, was assigned to SEMES Co. LTD. (Cheonan-si, South Korea).

"Substrate processing apparatus and method of controlling the same" was invented by Joonhwan Jang (Cheonan-si, South Korea), Soonkab Kwon (Gimhae-si, South Korea) and Hyoju Lee (Pohang-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus including a substrate processing unit including a support member configured to support a substrate, an entrance on one side of the substrate processing unit configured to allow the substrate to enter and exit the substrate processing unit, and a housing configured to accommodate the ...