ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,903, issued on Aug. 26, was assigned to SEMES Co. LTD. (Chungcheongnam-Do, South Korea).
"Substrate treating apparatus and substrate treating method" was invented by Won Sik Son (Gyeonggi-do, South Korea), Se Hoon Oh (Chungcheongnam-do, South Korea), Jin Kyu Kim (Gyeonggi-do, South Korea), In Ki Jung (Gyeonggi-do, South Korea) and Jeong Hyup Yu (Gyeonggi-do, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an apparatus for treating a substrate including: a processing vessel having a processing space; a support unit for supporting the substrate in the processing space and rotating the substrate; a liquid supply unit for supplyin...