ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,713,863, issued on Aug. 18, was assigned to SEMES Co. LTD. (Chungcheongnam-do, South Korea).

"Substrate treatment apparatus and method" was invented by Sang Young Kwon (Gyeonggi-do, South Korea) and Ki Young Kwak (Gyeonggi-do, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are a substrate treatment apparatus and method for treating a substrate while preventing the surface of the substrate from drying out. The substrate treatment method includes: moving a first nozzle to above a first point on a substrate; ejecting a first substrate treatment liquid onto the substrate from the first nozzle; moving a second nozzle to above the first p...