ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,706,276, issued on Aug. 11, was assigned to Semes Co. LTD. (Cheonan-si, South Korea).
"Substrate processing apparatus and substrate processing method" was invented by Chan Yong An (Cheonan-si, South Korea), Ja Myung Gu (Cheonan-si, South Korea), Sang Moon Yoo (Hwaseong-si, South Korea) and Tae Hoon Jo (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The inventive concept provides a substrate processing apparatus. The substrate processing apparatus may include a chamber having an interior space, a support unit that supports a substrate in the interior space, a ring unit disposed on an edge region of the support unit when viewed from abo...