ALEXANDRIA, Va., April 15 -- United States Patent no. 12,602,824, issued on April 14, was assigned to Semes Co. LTD. (Cheonan-si, South Korea).
"Substrate treating apparatus and substrate treating method" was invented by Ho Hun Lee (Suwon-si, South Korea) and Yong Seok Jang (Cheonan-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the inventive concept provide a substrate treating apparatus and a substrate treating method for allowing a position of a substrate to be known with only an analysis of an image with respect to a light source irradiated to a surrounding of the substrate. The inventive concept provides a substrate treating apparatus. The substrate treating apparatus incl...