ALEXANDRIA, Va., July 14 -- United States Patent no. 12,679,913, issued on July 14, was assigned to SEKISUI CHEMICAL Co. Ltd. (Osaka, Japan).
"Poly(vinyl alcohol) resin" was invented by Yuki Ishikawa (Osaka, Japan), Masumi Fujita (Osaka, Japan) and Shizuka Sugihara (Osaka, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention provides a polyvinyl alcohol resin with which a polyvinyl acetal resin having a controlled particle size and forming less lumps during dissolution to exhibit excellent solubility can be produced. Provided is a polyvinyl alcohol resin containing: methyl acetate; a vinyl alcohol unit; and a vinyl acetate unit, the methyl acetate being contained in an amount of 0.05 to...