US Patent Issued to SCREEN Holdings on Sept. 1 for "Substrate processing apparatus and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,442, issued on Sept. 1, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing apparatus and substrate processing method" was invented by Kana Tahara (Kyoto, Japan), Masaki Inaba (Kyoto, Japan) and Ryo Muramoto (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a substrate holding member that holds a substrate in a predetermined processing posture, a polymer film forming member that forms a polymer film that contains a photoacid generator that generates an acid by light irradiation and that contains a polymer on a first principal surface of the substrate held by the substrat...