US Patent Issued to SCREEN Holdings on Oct. 27 for "Substrate treatment method and substrate treatment device" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,777,860, issued on Oct. 27, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate treatment method and substrate treatment device" was invented by Kana Tahara (Kyoto, Japan) and Yukifumi Yoshida (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method includes a substrate preparation step of preparing a substrate having a major surface from which a first oxide layer is exposed, a first etching step of forming a first polymer film that contains a first acid polymer on the major surface of the substrate and etching the substrate, and a first rinsing step of supplying a first rinsing liquid that washes the ma...