ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,766,574, issued on Oct. 20, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing device and maintenance method for substrate processing device" was invented by Chiaki Moriya (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing device includes a processing chamber, three exhaust pipes, and an exhaust switching mechanism. The exhaust switching mechanism includes a switching box, three opening/closing mechanisms that individually open/close three communication ports for individually communicating the switching box and the three exhaust pipes, and three cleaning nozzles provided on an inner side of th...