ALEXANDRIA, Va., May 26 -- United States Patent no. 12,637,756, issued on May 26, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).
"Substrate treating apparatus and substrate treating method" was invented by Hirofumi Tonai (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a substrate treating apparatus for performing a predetermined treatment on a substrate. The apparatus includes: a holding mechanism including a plurality of support pins configured to rotate between a holding position and a delivery position, a first magnetic part configured to rotate the support pins individually between the holding position and the delivery position by switching surrounding magnetic poles, ...