US Patent Issued to SCREEN Holdings on May 19 for "Monitoring method in substrate processing apparatus and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,634,588, issued on May 19, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Monitoring method in substrate processing apparatus and substrate processing apparatus" was invented by Shinji Shimizu (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A monitoring method includes a setting-up processing step, a capturing step, and a monitoring step. The setting-up processing step includes a step of generating, with a camera, a plurality of preliminarily captured images corresponding to a plurality of irradiation modes, a step of identifying a non-existent region indicating at least one of a shadow and a reflected image of an object included ...