ALEXANDRIA, Va., May 19 -- United States Patent no. 12,635,449, issued on May 19, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).
"Heat treatment apparatus" was invented by Satoshi Segawa (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A chamber in which heating treatment is performed by irradiating a semiconductor wafer with light and a combustible gas supply source are connected in communication with each other by a combustible gas supply pipe. An electrical flow rate controller for regulating a supply flow rate of a combustible gas, and the like are interposed in the combustible gas supply pipe. Part of the combustible gas supply pipe which includes the electrical flow rate controlle...