ALEXANDRIA, Va., May 12 -- United States Patent no. 12,623,256, issued on May 12, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate processing method and substrate processing apparatus" was invented by Noritake Sumi (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method according to the invention includes a supercritical process step of processing a substrate by a processing fluid in a supercritical state by introducing the processing fluid into an internal space of the chamber accommodating the substrate, a decompression step of decompressing the internal space by discharging the processing fluid, a carry-out step of carrying out the substrate from the chamber,...