US Patent Issued to SCREEN Holdings on March 17 for "Substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,576,425, issued on March 17, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing method" was invented by Takayoshi Tanaka (Kyoto, Japan) and Masayuki Otsuji (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In this substrate processing method, a water-repellent treatment is performed on a upper surface of a substrate so as to change the contact angle of pure water with respect to a flat surface to 90deg or greater, and then a hydrophobic liquid is supplied to the upper surface of the substrate, thereby replacing a water repellent agent-containing liquid on the upper surface of the substrate with the hydrophobic liq...