US Patent Issued to SCREEN Holdings on July 28 for "Substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,696,743, issued on July 28, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing method" was invented by Kana Tahara (Kyoto, Japan) and Masaki Inaba (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An etching liquid is supplied to a principal surface of a substrate that has the principal surface on which a processing object layer having a plurality of crystal grains is exposed (first etching step). A polymer-containing liquid containing a polymer is supplied to the principal surface of the substrate after the first etching step, and a polymer layer at least portion of which is embedded in a crystal grain boundary wh...