ALEXANDRIA, Va., July 14 -- United States Patent no. 12,685,062, issued on July 14, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate cleaning device and substrate cleaning method" was invented by Takuma Takahashi (Kyoto, Japan), Tomoyuki Shinohara (Kyoto, Japan), Junichi Ishii (Kyoto, Japan), Kazuki Nakamura (Kyoto, Japan), Takashi Shinohara (Kyoto, Japan), Nobuaki Okita (Kyoto, Japan) and Yoshifumi Okada (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate cleaning device includes an upper holding device. The upper holding device holds a substrate in a horizontal attitude without rotating the substrate, while being in contact with an outer peripheral end of the substrate. A l...