US Patent Issued to SCREEN Holdings on Feb. 17 for "Substrate processing method, substrate processing apparatus, and processing liquid" (Japanese Inventor)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,551,935, issued on Feb. 17, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).

"Substrate processing method, substrate processing apparatus, and processing liquid" was invented by Yukifumi Yoshida (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing method includes a processing film forming step in which a processing liquid is supplied to a front surface of a substrate and the processing liquid on the front surface of the substrate is solidified or cured to form a processing film on the front surface of the substrate, an etching facilitating step in which the processing film is subjected to etching function developin...