US Patent Issued to SCREEN HOLDINGS on Dec. 2 for "Substrate cleaning device, substrate cleaning system, substrate processing system, substrate cleaning method and substrate processing method" (Japanese Inventors)

ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,485,461, issued on Dec. 2, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate cleaning device, substrate cleaning system, substrate processing system, substrate cleaning method and substrate processing method" was invented by Nobuaki Okita (Kyoto, Japan), Junichi Ishii (Kyoto, Japan), Kazuki Nakamura (Kyoto, Japan), Takashi Shinohara (Kyoto, Japan), Yoshifumi Okada (Kyoto, Japan), Tomoyuki Shinohara (Kyoto, Japan) and Takuma Takahashi (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An upper holding device holds a substrate in a horizontal attitude without rotating the substrate. A lower holding device rotates a substrate while hold...