US Patent Issued to SCREEN HOLDINGS on Dec. 16 for "Substrate processing method and substrate processing apparatus" (Japanese Inventor)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,078, issued on Dec. 16, was assigned to SCREEN HOLDINGS Co. LTD. (Japan).

"Substrate processing method and substrate processing apparatus" was invented by Noritake Sumi (Kyoto, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "In a substrate processing method according to this invention, a decompression process after processing a substrate using a fluid in a supercritical state in a chamber is divided into two stages. In the first decompress step, an internal space of the chamber is decompressed to a pressure lower than the critical pressure and higher than an atmospheric pressure while keeping the temperature of the internal space equal to or hi...