ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,496,622, issued on Dec. 16, was assigned to SCREEN Holdings Co. Ltd. (Japan).
"Substrate processing apparatus" was invented by Kazuhiko Nakazawa (Kyoto, Japan), Toshihito Morioka (Kyoto, Japan), Hiromichi Kaba (Kyoto, Japan) and Takashi Ota (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus delivers a gas between a lower surface of a substrate and a base surface of a base part to form an airflow flowing radially outward and to cause a pressure drop in a space between the substrate and the base part by the Bernoulli effect. The base surface includes a second surface sloping upward in a radially outward direction...