ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,361, issued on Aug. 4, was assigned to SCREEN Holdings Co. Ltd. (Japan).
"Substrate processing apparatus, substrate processing method, training data generation method, training method, training device, trained model creation method, and trained model" was invented by Seiji Ano (Kyoto, Japan) and Tomonori Kojimaru (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a substrate holding section, a chemical liquid supply section, a substrate information acquiring section, a chemical liquid processing condition information acquiring section, and a controller. The substrate information acquiring section ac...