ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,947, issued on April 7, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).
"Substrate treating apparatus" was invented by Kenji Amahisa (Kyoto, Japan), Shinichi Taniguchi (Kyoto, Japan) and Akihiro Iwasaki (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed is a substrate treating apparatus provided with a treating block. The treating block includes a wet transportation region adjoining a batch treatment region and a single-wafer transportation region. The wet transportation region contains a second posture turning mechanism provided on an extension line of a line of six batch process tanks and configured to turn a posture o...