ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,940, issued on April 7, was assigned to SCREEN Holdings Co. Ltd. (Kyoto, Japan).
"Method for measuring temperature" was invented by Yukio Ono (Kyoto, Japan) and Mao Omori (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An edge radiation thermometer performs measurements before a semiconductor wafer is transported into a chamber. The edge radiation thermometer performs the measurements while the semiconductor wafer is supported by lift pins and while the semiconductor wafer is placed on a susceptor, after the semiconductor wafer is transported into the chamber. A controller calculates a reflectivity of the semiconductor wafer based on th...