ALEXANDRIA, Va., April 15 -- United States Patent no. 12,599,925, issued on April 14, was assigned to SCREEN Holdings Co. Ltd. (Japan).
"Substrate processing apparatus and substrate processing method" was invented by Tomohiro Takahashi (Kyoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a substrate holding section that holds a substrate, a processing tank that stores a processing liquid allowing the substrate held by the substrate holding section to be immersed in, and a plurality of bubble generating pipes that each supply a gas to the processing liquid to generate bubbles in the processing liquid. Of the plurality of bubble generating pipes, a flow rate of...