US Patent Issued to Samsung SDI on Sept. 29 for "Semiconductor photoresist composition and method of forming patterns using the composition" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,748,348, issued on Sept. 29, was assigned to Samsung SDI Co. Ltd. (Yongin-si, South Korea).

"Semiconductor photoresist composition and method of forming patterns using the composition" was invented by Seol Hee Lim (Suwon-si, South Korea), Jaebum Lim (Suwon-si, South Korea), Yaeun Seo (Suwon-si, South Korea), Sumin Jang (Suwon-si, South Korea), Soobin Lim (Suwon-si, South Korea), Minyoung Lee (Suwon-si, South Korea), Jimin Kim (Suwon-si, South Korea), Jaeyeol Baek (Suwon-si, South Korea), Eunmi Kang (Suwon-si, South Korea) and Changsoo Woo (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor photoresist composition inclu...