ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,746,501, issued on Sept. 29, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).
"Exhaust system and exhaust method using buffer" was invented by Changseok Yoo (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "An exhaust system including a process chamber in which a semiconductor processing is performed, a buffer connected to the process chamber, the buffer configured to receive waste gas generated during the semiconductor processing and dualize and disperse powder generated from the waste gas may be provided, a reactor configured to burn the waste gas, a wet tank connected to the reactor, arranged below the rea...