US Patent Issued to SAMSUNG ELECTRONICS on Sept. 23 for "Valve structure and substrate processing apparatus including the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,424,465, issued on Sept. 23, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Valve structure and substrate processing apparatus including the same" was invented by Kangmin Park (Suwon-si, South Korea), Hyungho Kim (Suwon-si, South Korea), Dongwoo Wi (Hwaseong-si, South Korea), Hyunsoo Chun (Suwon-si, South Korea) and Jiho Uh (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A process chamber door for closing or opening an entrance of a process chamber through which a substrate to be process is loaded includes a seal plate including a front surface and a rear surface opposite to each other in a first direction,...