ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,742,240, issued on Sept. 22, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Semiconductor manufacturing apparatus, gas supplying method using the same, and semiconductor manufacturing method using the same" was invented by Chan Kyu Lim (Suwon-si, South Korea), Yoonbon Koo (Suwon-si, South Korea), Hanhim Kang (Suwon-si, South Korea), Suji Gim (Suwon-si, South Korea) and Jongkoo Lim (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure provides methods and apparatuses for supplying a process gas in a semiconductor manufacturing process. In some embodiments, the method includes heating, using ...