US Patent Issued to SAMSUNG ELECTRONICS on Sept. 15 for "Membrane coating compound for chemical mechanical polishing process, membrane including the same, and polishing apparatus including the same" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,734,637, issued on Sept. 15, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).

"Membrane coating compound for chemical mechanical polishing process, membrane including the same, and polishing apparatus including the same" was invented by Yearin Byun (Suwon-si, South Korea), Inkwon Kim (Suwon-si, South Korea) and Sangkyun Kim (Suwon-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "A membrane coating compound for a chemical mechanical polishing process, a membrane structure for a chemical mechanical polishing process, and a polishing apparatus for a chemical mechanical polishing process in which a wafer is holdable under...