ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,774,525, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea).
"Substrate stage and substrate processing apparatus including the same" was invented by Jihyeong Lee (Suwon-si, South Korea), Sangyeon Oh (Suwon-si, South Korea), Minsung Kim (Suwon-si, South Korea), Byeongsang Kim (Suwon-si, South Korea), Yihwan Kim (Suwon-si, South Korea) and Sangchul Han (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate processing apparatus includes a chamber providing a space for performing a semiconductor process on a semiconductor substrate, and a substrate stage configured to support the semiconductor ...