ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,777,708, issued on Oct. 27, was assigned to SAMSUNG ELECTRONICS Co. Ltd. (Gyeonggi-do, South Korea).
"Semiconductor device and methods of forming patterns" was invented by Juseong Min (Suwon-si, South Korea), Jae-Bok Baek (Suwon-si, South Korea), Taekkyu Yoon (Suwon-si, South Korea), Seungwook Choi (Suwon-si, South Korea), Jeehoon Han (Suwon-si, South Korea) and Taeyoon Hong (Suwon-si, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor device includes an active pattern having sharp corners. The semiconductor device includes a peripheral circuit including a substrate, a resistor device in the substrate, and an active pattern on th...